KPZ series
  • ⦿ KPZ series is an acid type etchant for PZT (lead zirconate titanate) film.
Products Temperature(℃) Etching rate  (35℃, Strong stirring, μm/min.) Cross-sectional shape Etching Method
KPZ-02 30~40 1~3 Vertical Spray
KPZ-04 20~35 10~20(5 ※) about 80° Dipping and spray

The etching rate and cross-sectional shape vary depending on the PZT film quality.
※No stirring

KNN series
  • ⦿ KNN series is an etchant for thin KNN (potassium sodium niobate) film.
  • ⦿ Basic and hydrogen peroxide etchant, capable of extremely fine processing.
  • ⦿ Hard masks such as SiO2, TEOS, and SiN are required for patterning.
Products Temperature(℃) Etching rate  (85℃, No stirring, nm/min.) Cross-sectional shape Etching Method
KNN-01 80~95 50 Vertical Dipping
KNN-02 80~95 70 Vertical Dipping

The etching rate and cross-sectional shape vary depending on the KNN film quality.